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white paper

Fast and Accurate EUV mask flow

Calibre RET platform

The long-promised transition from optical lithography to the use of EUV in high-volume manufacturing is underway. Although issues are still being ironed out, the one issue that is not preventing EUV in manufacturing is the resolution enhancement technology (RET) flow. While there are many unique aspects to RET with EUV, the challenges have been fully met with Calibre’s EUV products and technologies. This paper describes the basics of RET for EUV.