Calibre nmDRC Recon overview

Calibre nmDRC Recon is a Shift-left solution designed to help semiconductor designers identify systemic errors early in the design process. As chip designs grow larger and more complex, automation plays a critical role in layout generation. However, when different components are assembled, unintended issues such as shorts and misalignments can arise, leading to millions of errors and prolonged debug cycles.

Calibre nmDRC Recon leverages AI heuristics to analyze rule decks and identify local scope rules, which are checks that focus on nearby features rather than the entire chip layout. This includes spacing checks and other localized verification processes that don’t require scanning the entire design. By focusing on these smaller, isolated areas, Calibre nmDRC Recon significantly reduces runtime while accelerating error detection and resolution.

The benefits of using Calibre nmDRC Recon include faster debug cycles, optimized run times, improved productivity, and flexible customization. Errors are detected and resolved early, preventing costly iterations later in the design process. By isolating local errors instead of performing full-chip analysis, runs complete much faster. Designers no longer need to sift through millions of error results, allowing them to focus on targeted fixes. Users can also select specific rules to prioritize, tailoring the tool to their design needs.

By integrating Calibre nmDRC Recon into the design verification flow, engineers can avoid long delays, streamline iterations, and improve overall efficiency. The ability to quickly pinpoint root causes such as placement issues or fill problems helps designers address errors before they compound into larger bottlenecks.