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Status of curvilinear data format working group

The industry is moving full speed ahead to enable CL mask tools, data handling, and flows.

Sample evolution of OPC/MPC output polygon over several iterations.
In 2019, we proposed the formation of a data format working group to address the need for curvilinear data representation. The new working group was formed by major semiconductor companies with representations from Siemens EDA, Synopsys, Nippon Control Systems, D2S, Aselta, and ASML-BRION to quantify the curvilinear data volume problem; develop, test and implement new or revised formats based on OASIS; and to formalize the working group as a SEMI task force. In this paper, we introduce the necessity of a new curvilinear data format and the share progress of our task force. We also demonstrate that given the nature of curvilinear data, representing it using native curve formats has significant value to reduce file size for future mask making flows.

為什麼要使用曲線光罩？

IC 設計和製造以往將形狀表示為曼哈頓形狀。直線邊多邊形是一種高效利用可用空間的方式。圓形和曲線都會浪費空間，但在現實世界中，工藝角總會進行一定程度的圓化。直線邊設計在晶圓上呈現出圓形工藝角，主要是由於投影光學系統的低通性導致。由於光學/電子束刻寫機的工藝角解析度有限，直線邊設計在光罩上呈現圓形工藝角。

下一代微影製程的曝光要求促使微影製作人員探索曲線光罩的優勢。多電子束光罩刻寫機 (MBMW) 的問世，解決了和高頂點數有關的光罩刻寫執行時損失，並讓曲線 (CL) 光罩更有機會實現。

業界正全速推進，將曲線光罩工具、資料處理能力和流程化為可能。

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