Self-aligned double patterning design finishing: Improving results with DRC auto-fixing

Self-aligned double patterning processes are a staple in advanced technology nodes across the industry, but resolving DRC errors in SADP designs is one of several design finishing activities that can challenge design teams. GLOBALFOUNDRIES and Siemens EDA teams collaborated to create a better solution to this issue by implementing EDA tool functionality that can automatically decompose a layout or modify an existing partial or full decomposition, using built-in DRC rule awareness and error visualization.

A practical and efficient automated fixing process for self-aligned double patterning DRC violations

Despite the most careful human efforts and best-in-class design implementation tools, it is common to find DRC violations during sign-off verification of decomposed self-aligned double patterning layouts. If the designs were manually decomposed, then the designer must figure out modifications and make changes in potentially multiple decomposition output layers to resolve the errors. If the design implementation tool automatically generated the decomposed output, correction often requires making manual changes to the target metal shapes and re-running the decomposition to see if the errors are fixed. Both of these processes can be very iterative and time-consuming.

GLOBALFOUNDRIES and Siemens EDA engaged in extensive joint development work that led to more effective techniques and enhanced Calibre tools for solving these challenging and important design issues. The deployment of a practical and efficient automated fixing process for SADP DRC violations enables design teams to reduce both the resources and time needed to deliver DRC-clean SADP designs.