Self-aligned multi-patterning track decomposition techniques

Once the decision is made to use a specific SAMP process, designers must determine the optimal layout decomposition to produce the required masks while complying with all relevant design rules. IMEC and Siemens explain the decomposition requirements and techniques for generating DRC-compliant track (line) masks. The Calibre Multi-Patterning tool not only automates the decomposition process, but also helps designers more quickly and accurately debug errors when drawn target shapes do not enable proper track mask generation.