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Introduction to multi-patterning
Understanding multi-patterning decomposition and verification, whether it is double, triple, or quadruple litho-etch or self-aligned multi-patterning, is critical to manufacturing success.
Multi-patterning is essential to advanced node IC design, but the complexity of applying multi-patterning techniques to IC design layouts, as well as identifying and resolving errors, can be challenging. Whether designers are using a double, triple, or quadruple litho-etch patterning technique, or a self-aligned double or quadruple patterning method, understanding the concept and application of different multi-patterning techniques is essential to accurate design decomposition and error analysis. Multi-patterning EDA tools that automate design decomposition and provide fixing guidance during verification can help.