Reshaping the lithography industry with Calibre Advanced OPC Solutions

Introducing Calibre Advanced OPC Solutions, revolutionizing lithography with accurate, consistent solutions tailored for semiconductor manufacturing's biggest challenges. Our technology ensures fast turn around time (TAT) and a robust process window, vital for silicon photonics, AR/VR, memory designs, and advanced nodes. Leveraging advanced algorithms and computational methods, Calibre Advanced OPC Solutions optimize photomasks, ensuring flawless designs and improved yields. With GPU acceleration, machine learning, and innovative features like a curvilinear engine and multigon support, Calibre empowers manufacturers with efficiency and precision, ushering in a new era of semiconductor innovations.