white paper
Using curvature-based pre-bias to reduce iterations in curvilinear mask process correction
However, the computational complexity of MPC on curvilinear masks is higher than on rectilinear masks because the movement algorithm is more complex and the number of edges to be processed is significantly higher on curvilinear masks. The complexity requires several iterations for convergence of MPC correction when the curvilinear shapes are complicated. This paper shows how using curvature-based pre-bias reduces the number of iterations required to reach convergence in curvilinear mask correction. The pre-bias is generated with a simple curvature model and does not require high compute resources so the total runtime of curvilinear MPC can also be reduced.