Building CMP models for CMP simulation and hotspot detection
CMP simulations enable designers to optimize IC design layouts before manufacturing
CMP modeling has become a powerful tool for both process engineers and chip designers. It enables design teams to detect potential CMP hotspots prior to manufacturing by providing visualization and analysis of simulated CMP results. The Calibre CMP ModelBuilder and Calibre CMPAnalyzer tools from Siemens EDA support CMP model building, multi-layer full-chip CMP simulation, and hotspot detection and analysis. Efficient, accurate CMP simulation is crucial to continuing design process optimization while improving manufacturing results.