Computational lithography for simultaneously optimizing mask and illumination
The Calibre pxSMO for source and mask optimization helps chip manufacturers create complex patterns and structures previously unachievable. As a key resolution enhancement technique (RET), it reduces manufacturing defects and improves semiconductor chip quality by fine-tuning the source and mask to minimize variations and distortions during lithography. This results in higher yield and more reliable, cost-effective electronic devices. The tool uses pxOPC technology, optimizing individual layout clips with both mask and illumination to achieve objectives like EPE, image slope, and common depth of focus. Calibre pxSMO is a crucial computational lithography tool for enhancing process margin and increasing yield at advanced node technologies.