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Calibre nmLVS Introduction

Estimated Watching Time: 4 minutes
Wael Manhawy, Calibre LVS Product Manager, gives an overview of the Calibre nmLVS platform, including a brief rundown on some current industry trends and challenges. These include the increase in design complexity, coupled with increased numbers of layers, devices, and rules. Plus, the density of the standard cells is getting higher. Addressing the runtimes and the memory consumption adds to these challenges. In order to address these challenges, we’re working with foundries to identify the new SPICE parameters that they develop for new technologies, we’re doing R&D on exactly what are the APIs needed to accommodate the new complexity and requirements, we’re coordinating with partners to ensure first-pass success, and we’re supporting new technologies such as GAA (gate all around).

Wael gives a comprehensive rundown on the Calibre nmLVS platform, along with our new Shift left initiative, which brings Calibre verification and debugging capabilities earlier into the design process, leading to lower costs and decreased turnaround times.

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