Achieving precision in parasitic extraction

Parasitic extraction is a critical process in semiconductor design, particularly for digital integrated circuits (ICs). It involves identifying and modeling unintended resistances, capacitances, and interconnects that can significantly affect circuit performance. Calibre xACT stands out as a leading tool in this domain, offering robust capabilities for both analog and digital design flows. By combining the precision of field solver methods with the efficiency of rule-based approaches, Calibre xACT provides accurate parasitic extraction that supports critical design decisions, ensuring signal integrity, timing closure, and overall reliability in IC development. This tool is indispensable for achieving design closure, especially in advanced technology nodes where parasitic effects are more pronounced. Calibre xACT's features, such as multi-corner extraction, metal fill extraction, and hierarchical LEF/DEF extraction, make it a comprehensive solution for semiconductor designers aiming to deliver high-quality IC products to market efficiently.

This paper outlines the comprehensive features and advantages of Calibre xACT in supporting multi-corner extraction, metal fill modeling, and hierarchical LEF/DEF extraction, enabling IC designers to enhance signal integrity and meet stringent performance requirements. The tool's capabilities are critical for maintaining reliability and achieving successful design closure, thereby accelerating the delivery of high-quality semiconductor products to market.

What you'll learn:

• How to achieve precision in parasitic extraction through hybrid approaches
• How to increase efficiency and flexibility in digital design flows
• How Calibre xACT supports advanced ic design requirements

"Calibre xACT empowers designers to intricately capture the nuanced interactions among interconnects and devices, providing invaluable insights for optimizing design performance and mitigating signal integrity concerns." -Nada Tarek, Siemens EDA product engineer and author

Who should read this:

• Physical verification engineers and IC designers interested in accurate resistance extraction for curvilinear designs
• IC and SoC designers interested in the latest advancements in resistance extraction